GIK Centella Glossy Mask, Soothing Repair for Sensitive and Acne-prone Skin 21 Sheets

GIK Centella Glossy Mask delivers rapid relief for compromised skin. Formulated with centella asiatica extract, sodium hyaluronate, and urea, this sheet mask penetrates deeply to calm redness and soothe irritation within minutes. The advanced blend of alginic acid and betaine restores hydration, addressing dryness, dullness, and rough texture while rebalancing skin's moisture-oil equilibrium. Ideal for sensitive, acne-prone, and sun-stressed skin, each mask provides intensive repair and recovery. Perfect for emergency skincare when your complexion needs immediate restoration and stabilization.